Centro de Documentacion de Fundación MAPFRE - A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

Notes: Sumario: Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facilityRelated records: En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 50, nº 2, February 1989 ; p. 70-77Materia / lugar / evento: Higiene industrial Contaminantes químicos Gases tóxicos Vapores Detectores de gases Espectrometría FTIR Otros autores: Levine, Steven P.
Herget, William F.
Secondary titles: Título: American Industrial Hygiene Association journal
Other categories: 872