A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

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<title>Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions</title>
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<title>American Industrial Hygiene Association journal</title>
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<name type="personal" usage="primary" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080311483">
<namePart>Strang, Christopher R.</namePart>
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<namePart>Levine, Steven P.</namePart>
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<namePart>Herget, William F.</namePart>
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<abstract displayLabel="Summary">Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility</abstract>
<note type="statement of responsibility">Christopher R. Strang, Steven P. Levine and William F. Herget</note>
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<topic>Contaminantes químicos</topic>
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<topic>Gases tóxicos</topic>
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<text>Vol. 50, nº 2, February 1989 ; p. 70-77</text>
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