A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

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      <subfield code="a">A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions</subfield>
      <subfield code="c">Christopher R. Strang, Steven P. Levine and William F. Herget</subfield>
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      <subfield code="a">Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility</subfield>
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      <subfield code="a">American Industrial Hygiene Association journal</subfield>
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      <subfield code="g">Vol. 50, nº 2, February 1989 ; p. 70-77</subfield>
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