Assessment of arsenic exposures and control in galium arsenide production

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<title>Assessment of arsenic exposures and control in galium arsenide production</title>
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<title>American Industrial Hygiene Association journal</title>
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<namePart>Sheehy, John W.</namePart>
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<namePart>Jones, James H.</namePart>
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<abstract displayLabel="Summary">This paper summarizes the control measures and arsenic exposures determined for the following gallium arsenide processes: Liquid Encapsulated Czochralski (LEC) and Horizontal Bridgeman (HB) crystal growing, LEC cleaning operations, ingot grinding/wafer sawing, and epitaxy</abstract>
<note type="statement of responsibility">John W. Sheehy and James H. Jones</note>
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<topic>Higiene industrial</topic>
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<topic>Contaminantes químicos</topic>
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<topic>Productos químicos</topic>
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<topic>Arsénico</topic>
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<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080583606">
<topic>Arseniuro de galio</topic>
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<topic>Procesos industriales</topic>
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<topic>Control de procesos</topic>
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<title>American Industrial Hygiene Association journal</title>
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<publisher>Fairfax, Virginia</publisher>
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<text>Vol. 54, nº 2, February 1993 ; p. 61-69</text>
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