Development and validation of a protocol for field validation of passive dosimeters for ethylene oxide excursion limit monitoring

<?xml version="1.0" encoding="UTF-8" standalone="no"?>
<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance">
<rdf:Description>
<dc:creator>Puskar, Mark A.</dc:creator>
<dc:creator>Szopinski, Frank G.</dc:creator>
<dc:creator>Hecker, Lawrence H.</dc:creator>
<dc:date>1991-04-01</dc:date>
<dc:description xml:lang="es">Sumario: An exposure and analysis protocol is described for the field validation of passive dosimeters for ethylene oxide excursion limit monitoring. The protocol calls for the use of a field exposure chamber with concurrent sampling using Tedlar air-sampling bags. The bags are analyzed inmediately after sampling by gas chromatography with flame ionization detection</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/48010.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Oxido de etileno</dc:subject>
<dc:subject xml:lang="es">Control de contaminantes</dc:subject>
<dc:subject xml:lang="es">Dosimetría</dc:subject>
<dc:subject xml:lang="es">Dosímetros</dc:subject>
<dc:subject xml:lang="es">Protocolo</dc:subject>
<dc:subject xml:lang="es">Validación</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">Development and validation of a protocol for field validation of passive dosimeters for ethylene oxide excursion limit monitoring</dc:title>
<dc:title xml:lang="es">Título: American Industrial Hygiene Association journal</dc:title>
<dc:relation xml:lang="es">En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 52, nº 4, April 1991 ; p. 145-150</dc:relation>
</rdf:Description>
</rdf:RDF>