Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide
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| Tag | 1 | 2 | Value |
|---|---|---|---|
| LDR | 00000nab a2200000 i 4500 | ||
| 001 | MAP20071020309 | ||
| 003 | MAP | ||
| 005 | 20080418120150.0 | ||
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| 008 | 940701e19910401usa|||| | |00010|eng d | ||
| 035 | $a6800013521 | ||
| 040 | $aMAP$bspa | ||
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| 100 | 1 | $0MAPA20080255763$aSzopinski, Frank G. | |
| 245 | 1 | 0 | $aField validation of three passive dosimeters for excursion limit monitoring of ethylene oxide$cFrank G. Szopinski, Mark A. Puskar, Lawrence H. Hecker |
| 520 | $aIn this study, the method accuracy of three types of ethylene oxide passive dosimeters (3M 3550/3551, Crystal Diagnostics AirScan, and Assay Technology EO CHEM CHIP) were estimated in a hospital products sterilization facility at concentrations bracketing the 5 ppm excursion limit. A specially designed field exposure chamber was developed to allow all monitors to be exposed for the exact same time in the field. The validation of this exposure chamber and sampling protocol is detailed | ||
| 650 | 1 | 1 | $0MAPA20080585679$aHigiene industrial |
| 650 | 1 | 1 | $0MAPA20080605278$aContaminantes químicos |
| 650 | 1 | 1 | $0MAPA20080576974$aOxido de etileno |
| 650 | 1 | 1 | $0MAPA20080613655$aControl de contaminantes |
| 650 | 1 | 1 | $0MAPA20080554033$aDosimetría |
| 650 | 1 | 1 | $0MAPA20080554040$aDosímetros |
| 650 | 1 | 1 | $0MAPA20080552282$aProtocolo |
| 650 | 1 | 1 | $0MAPA20080556891$aValidación |
| 700 | 1 | $0MAPA20080145033$aPuskar, Mark A. | |
| 700 | 1 | $0MAPA20080244958$aHecker, Lawrence H. | |
| 740 | 0 | $aAmerican Industrial Hygiene Association journal | |
| 773 | 0 | $tAmerican Industrial Hygiene Association journal$dAkron, Ohio$gVol. 52, nº 4, April 1991 ; p. 151-157 |