Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide

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      <subfield code="a">Szopinski, Frank G.</subfield>
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      <subfield code="a">Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide</subfield>
      <subfield code="c">Frank G. Szopinski, Mark A. Puskar, Lawrence H. Hecker</subfield>
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      <subfield code="a">In this study, the method accuracy of three types of ethylene oxide passive dosimeters (3M 3550/3551, Crystal Diagnostics AirScan, and Assay Technology EO CHEM CHIP) were estimated in a hospital products sterilization facility at concentrations bracketing the 5 ppm excursion limit. A specially designed field exposure chamber was developed to allow all monitors to be exposed for the exact same time in the field. The validation of this exposure chamber and sampling protocol is detailed</subfield>
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      <subfield code="a">Oxido de etileno</subfield>
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      <subfield code="a">Control de contaminantes</subfield>
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      <subfield code="a">Puskar, Mark A.</subfield>
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      <subfield code="a">Hecker, Lawrence H.</subfield>
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      <subfield code="a">American Industrial Hygiene Association journal</subfield>
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      <subfield code="t">American Industrial Hygiene Association journal</subfield>
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      <subfield code="g">Vol. 52, nº 4, April 1991 ; p. 151-157</subfield>
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