Generation of ethylene oxide permissible exposure limit data with on-site sample analysis using the EO Self-ScanTM passive monitor

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<rdf:Description>
<dc:creator>Puskar, Mark A.</dc:creator>
<dc:creator>Nowak, Julie L.</dc:creator>
<dc:creator>Hecker, Lawrence H.</dc:creator>
<dc:date>1990-05-01</dc:date>
<dc:description xml:lang="es">Sumario: A sampling and analytical method is presented for the use of EO Self-ScanTM dosimeters for the determination of ethylene oxide permissible exposure limit (PEL) data. Analysis and report generation are performed on-site by trained personnel. A computer program for performing the calculaations required to obtain accurate exposure data is described</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/48184.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Oxido de etileno</dc:subject>
<dc:subject xml:lang="es">Control de contaminantes</dc:subject>
<dc:subject xml:lang="es">Dosimetría</dc:subject>
<dc:subject xml:lang="es">Dosímetros</dc:subject>
<dc:subject xml:lang="es">Métodos de análisis</dc:subject>
<dc:subject xml:lang="es">Valores TLV</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">Generation of ethylene oxide permissible exposure limit data with on-site sample analysis using the EO Self-ScanTM passive monitor</dc:title>
<dc:title xml:lang="es">Título: American Industrial Hygiene Association journal</dc:title>
<dc:relation xml:lang="es">En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 51, nº 5, May 1990 ; p. 273-279</dc:relation>
</rdf:Description>
</rdf:RDF>