Contamination in an experimental gallium arsenide etch system

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<rdf:Description>
<dc:creator>Ruuskanen, J.</dc:creator>
<dc:date>1990-01-01</dc:date>
<dc:description xml:lang="es">Sumario: A study in a university setting was undertaken on the by-products which accumulated within a plasma etching reactor system from two years of sporadic dry etching of gallium arsenide wafers. The deposits on the reactor chamber walls, in the vacuum pump oil and its filter, in the oil mist eliminator, and in the exhaust charcoal canister were analyzed for 33 elements by simultaneous inductively coupled plasma atomic emission spectroscopy</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/48199.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Control de contaminantes</dc:subject>
<dc:subject xml:lang="es">Arsénico</dc:subject>
<dc:subject xml:lang="es">Arseniuro de galio</dc:subject>
<dc:subject xml:lang="es">Muestreos</dc:subject>
<dc:subject xml:lang="es">Métodos de análisis</dc:subject>
<dc:subject xml:lang="es">Espectroscopia de absorción atómica</dc:subject>
<dc:subject xml:lang="es">Riesgo laboral</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">Contamination in an experimental gallium arsenide etch system</dc:title>
<dc:title xml:lang="es">Título: American Industrial Hygiene Association journal</dc:title>
<dc:relation xml:lang="es">En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 51, nº 1, January 1990 ; p. 8-13</dc:relation>
</rdf:Description>
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