Contamination in an experimental gallium arsenide etch system

<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.loc.gov/MARC21/slim http://www.loc.gov/standards/marcxml/schema/MARC21slim.xsd">
  <record>
    <leader>00000nab a2200000 i 4500</leader>
    <controlfield tag="001">MAP20071020493</controlfield>
    <controlfield tag="003">MAP</controlfield>
    <controlfield tag="005">20080418120238.0</controlfield>
    <controlfield tag="007">hzruuu---uuuu</controlfield>
    <controlfield tag="008">940712e19900101usa||||    | |00010|eng d</controlfield>
    <datafield tag="035" ind1=" " ind2=" ">
      <subfield code="a">6800013611</subfield>
    </datafield>
    <datafield tag="040" ind1=" " ind2=" ">
      <subfield code="a">MAP</subfield>
      <subfield code="b">spa</subfield>
    </datafield>
    <datafield tag="084" ind1=" " ind2=" ">
      <subfield code="a">872</subfield>
    </datafield>
    <datafield tag="245" ind1="1" ind2="0">
      <subfield code="a">Contamination in an experimental gallium arsenide etch system</subfield>
      <subfield code="c">J. Ruuskanen... [et al.]</subfield>
    </datafield>
    <datafield tag="520" ind1=" " ind2=" ">
      <subfield code="a">A study in a university setting was undertaken on the by-products which accumulated within a plasma etching reactor system from two years of sporadic dry etching of gallium arsenide wafers. The deposits on the reactor chamber walls, in the vacuum pump oil and its filter, in the oil mist eliminator, and in the exhaust charcoal canister were analyzed for 33 elements by simultaneous inductively coupled plasma atomic emission spectroscopy</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080585679</subfield>
      <subfield code="a">Higiene industrial</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080605278</subfield>
      <subfield code="a">Contaminantes químicos</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080613655</subfield>
      <subfield code="a">Control de contaminantes</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080546038</subfield>
      <subfield code="a">Arsénico</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080583606</subfield>
      <subfield code="a">Arseniuro de galio</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080551797</subfield>
      <subfield code="a">Muestreos</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080591960</subfield>
      <subfield code="a">Métodos de análisis</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080630867</subfield>
      <subfield code="a">Espectroscopia de absorción atómica</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080570484</subfield>
      <subfield code="a">Riesgo laboral</subfield>
    </datafield>
    <datafield tag="700" ind1="1" ind2=" ">
      <subfield code="0">MAPA20080083472</subfield>
      <subfield code="a">Ruuskanen, J.</subfield>
    </datafield>
    <datafield tag="740" ind1="0" ind2=" ">
      <subfield code="a">American Industrial Hygiene Association journal</subfield>
    </datafield>
    <datafield tag="773" ind1="0" ind2=" ">
      <subfield code="t">American Industrial Hygiene Association journal</subfield>
      <subfield code="d">Akron, Ohio</subfield>
      <subfield code="g">Vol. 51, nº 1, January 1990 ; p. 8-13</subfield>
    </datafield>
  </record>
</collection>