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Arsenic levels in hair of workers in a semiconductor fabrication facility

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MARC record
Tag12Value
LDR  00000nab a2200000 i 4500
001  MAP20071022872
003  MAP
005  20080418120754.0
007  hzruuu---uuuu
008  950630e19950401usa|||| | |00010|eng d
040  ‎$a‎MAP‎$b‎spa
084  ‎$a‎872
1001 ‎$0‎MAPA20080144005‎$a‎Peyster, Ann de
24510‎$a‎Arsenic levels in hair of workers in a semiconductor fabrication facility‎$c‎Ann de Peyster, Jeffrey A. Silvers
520  ‎$a‎The study examined the relationship between total arsenic levels in hair of employees in a semiconductor farbrication facility and job responsibility, a surrogate variable for arsenic exposure potential. Maintenance personnel who regularly worked in equipment cleaning areas were assumed to have higher potential for occupational exposure than other employees. Occipital scalp hair samples were collected from 30 maintenance personnel, supervisors, and equipment engineers with highm, medium, and low potential for exposure and from 26 administrative employees. Total arsenic in hair was measured by atomic absorption spectroscopy with hydride generation
65011‎$0‎MAPA20080585679‎$a‎Higiene industrial
65011‎$0‎MAPA20080595166‎$a‎Circuitos eléctricos
65011‎$0‎MAPA20080573942‎$a‎Semiconductores
65011‎$0‎MAPA20080568832‎$a‎Espectroscopia
65011‎$0‎MAPA20080589127‎$a‎Arsénico inorgánico
65011‎$0‎MAPA20080543266‎$a‎Cabello
65011‎$0‎MAPA20080560973‎$a‎Valores TLV
65011‎$0‎MAPA20080560850‎$a‎Toxicología
7001 ‎$0‎MAPA20080255114‎$a‎Silvers, Jeffrey A.
7400 ‎$a‎American Industrial Hygiene Association journal
7730 ‎$t‎American Industrial Hygiene Association journal‎$d‎Akron, Ohio‎$g‎Vol. 56, nº 4, April 1995 ; p. 377-383