Search

Arsenic levels in hair of workers in a semiconductor fabrication facility

<?xml version="1.0" encoding="UTF-8"?><modsCollection xmlns="http://www.loc.gov/mods/v3" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-8.xsd">
<mods version="3.8">
<titleInfo>
<title>Arsenic levels in hair of workers in a semiconductor fabrication facility</title>
</titleInfo>
<titleInfo type="alternative">
<title>American Industrial Hygiene Association journal</title>
</titleInfo>
<name type="personal" usage="primary" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080144005">
<namePart>Peyster, Ann de</namePart>
<nameIdentifier>MAPA20080144005</nameIdentifier>
</name>
<name type="personal" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080255114">
<namePart>Silvers, Jeffrey A.</namePart>
<nameIdentifier>MAPA20080255114</nameIdentifier>
</name>
<typeOfResource>text</typeOfResource>
<originInfo>
<place>
<placeTerm type="code" authority="marccountry">usa</placeTerm>
</place>
<dateIssued encoding="marc">1995</dateIssued>
<issuance>serial</issuance>
</originInfo>
<language>
<languageTerm type="code" authority="iso639-2b">eng</languageTerm>
</language>
<physicalDescription>
<form authority="marcform">print</form>
<form authority="marccategory">microform</form>
</physicalDescription>
<abstract displayLabel="Summary">The study examined the relationship between total arsenic levels in hair of employees in a semiconductor farbrication facility and job responsibility, a surrogate variable for arsenic exposure potential. Maintenance personnel who regularly worked in equipment cleaning areas were assumed to have higher potential for occupational exposure than other employees. Occipital scalp hair samples were collected from 30 maintenance personnel, supervisors, and equipment engineers with highm, medium, and low potential for exposure and from 26 administrative employees. Total arsenic in hair was measured by atomic absorption spectroscopy with hydride generation</abstract>
<note type="statement of responsibility">Ann de Peyster, Jeffrey A. Silvers</note>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080585679">
<topic>Higiene industrial</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080595166">
<topic>Circuitos eléctricos</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080573942">
<topic>Semiconductores</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080568832">
<topic>Espectroscopia</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080589127">
<topic>Arsénico inorgánico</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080543266">
<topic>Cabello</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080560973">
<topic>Valores TLV</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080560850">
<topic>Toxicología</topic>
</subject>
<classification authority="">872</classification>
<relatedItem type="host">
<titleInfo>
<title>American Industrial Hygiene Association journal</title>
</titleInfo>
<originInfo>
<publisher>Akron, Ohio</publisher>
</originInfo>
<part>
<text>Vol. 56, nº 4, April 1995 ; p. 377-383</text>
</part>
</relatedItem>
<recordInfo>
<recordContentSource authority="marcorg">MAP</recordContentSource>
<recordCreationDate encoding="marc">950630</recordCreationDate>
<recordChangeDate encoding="iso8601">20080418120754.0</recordChangeDate>
<recordIdentifier source="MAP">MAP20071022872</recordIdentifier>
<languageOfCataloging>
<languageTerm type="code" authority="iso639-2b">spa</languageTerm>
</languageOfCataloging>
</recordInfo>
</mods>
</modsCollection>