Arsenic levels in hair of workers in a semiconductor fabrication facility

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<title>Arsenic levels in hair of workers in a semiconductor fabrication facility</title>
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<title>American Industrial Hygiene Association journal</title>
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<namePart>Peyster, Ann de</namePart>
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<namePart>Silvers, Jeffrey A.</namePart>
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<abstract displayLabel="Summary">The study examined the relationship between total arsenic levels in hair of employees in a semiconductor farbrication facility and job responsibility, a surrogate variable for arsenic exposure potential. Maintenance personnel who regularly worked in equipment cleaning areas were assumed to have higher potential for occupational exposure than other employees. Occipital scalp hair samples were collected from 30 maintenance personnel, supervisors, and equipment engineers with highm, medium, and low potential for exposure and from 26 administrative employees. Total arsenic in hair was measured by atomic absorption spectroscopy with hydride generation</abstract>
<note type="statement of responsibility">Ann de Peyster, Jeffrey A. Silvers</note>
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<topic>Circuitos eléctricos</topic>
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<topic>Semiconductores</topic>
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<text>Vol. 56, nº 4, April 1995 ; p. 377-383</text>
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