Mathematical models for estimating occupational exposure to chemicals

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<dc:contributor>Keil, Charles B., ed.</dc:contributor>
<dc:creator>American Industrial Hygiene Association. Exposure Assessment Strategies Committee. Modeling Subcommittee</dc:creator>
<dc:date>1999</dc:date>
<dc:description xml:lang="es">Sumario: Preface -- Why model? -- Indoor air systems -- Vapor pressure and the saturation vapor pressure model -- Generation rate models -- Box models -- Well-mixed model: back pressure-affected generation rate -- Well-mixed model: exponentially decreasing emission rate -- Two-zone model -- Eddy diffusion modeling -- Dermal exposure modeling -- Appendix A: Elementary calculus principles used in modeling -- Appendix B: Sources of vapor pressure data -- Appendix C: basic code for backpressure modeling</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/114531.do</dc:identifier>
<dc:language>spa</dc:language>
<dc:publisher>American Industrial Hygiene Association</dc:publisher>
<dc:publisher>Keil, Charles B.</dc:publisher>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Agentes contaminantes</dc:subject>
<dc:subject xml:lang="es">Emisiones contaminantes</dc:subject>
<dc:subject xml:lang="es">Vapores</dc:subject>
<dc:subject xml:lang="es">Aire viciado</dc:subject>
<dc:subject xml:lang="es">Modelos analíticos</dc:subject>
<dc:subject xml:lang="es">Modelos matemáticos</dc:subject>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Toxicología laboral</dc:subject>
<dc:type xml:lang="es">Libros</dc:type>
<dc:title xml:lang="es">Mathematical models for estimating occupational exposure to chemicals</dc:title>
<dc:format xml:lang="es">XII; 106 p. ; 28 cm.</dc:format>
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