The Limits of detection for the monitoring of semiconductor manufacturing gas and vapor emissions by Fourier transform infrared (FTIR) spectroscopy

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<title>Limits of detection for the monitoring of semiconductor manufacturing gas and vapor emissions by Fourier transform infrared (FTIR) spectroscopy</title>
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<title>American Industrial Hygiene Association journal</title>
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<name type="personal" usage="primary" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080311483">
<namePart>Strang, Christopher R.</namePart>
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<namePart>Levine, Steven P.</namePart>
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<dateIssued encoding="marc">1989</dateIssued>
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<abstract displayLabel="Summary">To determine whether or not the Fourier transform infrared (FTIR) spectrometer is appropriate for industrial hygiene monitoring of the gases and vapors used in the semiconductor industry, the limits of detection (LOD) of these compounds were determined. The LODs were calculated using several widely used definitions to test whether the values obtained by the different methods would vary significantly. The experimental LOD values for the study compounds all were below their respective threshold limit values (TLVs)</abstract>
<note type="statement of responsibility">Christopher R. Strang and Steven P. Levine</note>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080585679">
<topic>Higiene industrial</topic>
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<topic>Contaminantes químicos</topic>
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<topic>Gases tóxicos</topic>
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<topic>Vapores</topic>
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<topic>Detectores de gases</topic>
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<topic>Espectrometría</topic>
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<topic>FTIR</topic>
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<topic>Valores TLV</topic>
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<topic>Espectroscopia</topic>
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<title>American Industrial Hygiene Association journal</title>
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<publisher>Akron, Ohio</publisher>
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<text>Vol. 50, nº 2, February 1989 ; p. 78-84</text>
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