Búsqueda

Contamination in an experimental gallium arsenide etch system

Fichero PDF / PDF file
Registro MARC
Tag12Valor
LDR  00000nab a2200000 i 4500
001  MAP20071020493
003  MAP
005  20080418120238.0
007  hzruuu---uuuu
008  940712e19900101usa|||| | |00010|eng d
035  ‎$a‎6800013611
040  ‎$a‎MAP‎$b‎spa
084  ‎$a‎872
24510‎$a‎Contamination in an experimental gallium arsenide etch system‎$c‎J. Ruuskanen... [et al.]
520  ‎$a‎A study in a university setting was undertaken on the by-products which accumulated within a plasma etching reactor system from two years of sporadic dry etching of gallium arsenide wafers. The deposits on the reactor chamber walls, in the vacuum pump oil and its filter, in the oil mist eliminator, and in the exhaust charcoal canister were analyzed for 33 elements by simultaneous inductively coupled plasma atomic emission spectroscopy
65011‎$0‎MAPA20080585679‎$a‎Higiene industrial
65011‎$0‎MAPA20080605278‎$a‎Contaminantes químicos
65011‎$0‎MAPA20080613655‎$a‎Control de contaminantes
65011‎$0‎MAPA20080546038‎$a‎Arsénico
65011‎$0‎MAPA20080583606‎$a‎Arseniuro de galio
65011‎$0‎MAPA20080551797‎$a‎Muestreos
65011‎$0‎MAPA20080591960‎$a‎Métodos de análisis
65011‎$0‎MAPA20080630867‎$a‎Espectroscopia de absorción atómica
65011‎$0‎MAPA20080570484‎$a‎Riesgo laboral
7001 ‎$0‎MAPA20080083472‎$a‎Ruuskanen, J.
7400 ‎$a‎American Industrial Hygiene Association journal
7730 ‎$t‎American Industrial Hygiene Association journal‎$d‎Akron, Ohio‎$g‎Vol. 51, nº 1, January 1990 ; p. 8-13