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Contamination in an experimental gallium arsenide etch system
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MAP20071020493
Contamination in an experimental gallium arsenide etch system / J. Ruuskanen... [et al.]
Sumario: A study in a university setting was undertaken on the by-products which accumulated within a plasma etching reactor system from two years of sporadic dry etching of gallium arsenide wafers. The deposits on the reactor chamber walls, in the vacuum pump oil and its filter, in the oil mist eliminator, and in the exhaust charcoal canister were analyzed for 33 elements by simultaneous inductively coupled plasma atomic emission spectroscopy
En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 51, nº 1, January 1990 ; p. 8-13
1. Higiene industrial ‌. 2. Contaminantes químicos ‌. 3. Control de contaminantes ‌. 4. Arsénico ‌. 5. Arseniuro de galio ‌. 6. Muestreos ‌. 7. Métodos de análisis ‌. 8. Espectroscopia de absorción atómica ‌. 9. Riesgo laboral ‌. I. Ruuskanen, J. ‌. II. Título. III. Título: American Industrial Hygiene Association journal.