Occupational exposure to trichloroethylene in metal cleaning processes and to tetrachloroethylene in the drycleaning industry in the U.K.

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<rdf:Description>
<dc:creator>Shipman, A.J.</dc:creator>
<dc:creator>Whim, B.P.</dc:creator>
<dc:date>1980</dc:date>
<dc:description xml:lang="es">Sumario: Personal monitoring surveys are being carried out to measure time weighted average concentrations to which operators may be exposed when using trichloroethylene for metal cleaning and perchloroethylene for professional drycleaning. The technique is based upon the Sipin personal sampler which continuously draws from the vicinity of the operator's face, a sample of air, which is passed over activated carbon to adsorb the solvent vapour. Preliminary results are given for levels of exposure to each solvent which indicate that the large majority of installations operate well bellow the Threshold Limit Values (TLVs)</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/45579.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Tricloroetileno</dc:subject>
<dc:subject xml:lang="es">Percloroetileno</dc:subject>
<dc:subject xml:lang="es">Disolventes industriales</dc:subject>
<dc:subject xml:lang="es">Riesgo laboral</dc:subject>
<dc:subject xml:lang="es">Toxicología</dc:subject>
<dc:subject xml:lang="es">Valores TLV</dc:subject>
<dc:subject xml:lang="es">Gran Bretaña</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">Occupational exposure to trichloroethylene in metal cleaning processes and to tetrachloroethylene in the drycleaning industry in the U.K.</dc:title>
<dc:title xml:lang="es">Título: The Annals of occupational hygiene</dc:title>
<dc:relation xml:lang="es">En: The Annals of occupational hygiene. - Oxford [etc.]. - nº 2, 1980 ; p. 197-204</dc:relation>
</rdf:Description>
</rdf:RDF>