A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions
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| 100 | 1 | $0MAPA20080311483$aStrang, Christopher R. | |
| 245 | 1 | 2 | $aA Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions$cChristopher R. Strang, Steven P. Levine and William F. Herget |
| 520 | $aPreliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility | ||
| 650 | 1 | 1 | $0MAPA20080585679$aHigiene industrial |
| 650 | 1 | 1 | $0MAPA20080605278$aContaminantes químicos |
| 650 | 1 | 1 | $0MAPA20080565817$aGases tóxicos |
| 650 | 1 | 1 | $0MAPA20080545673$aVapores |
| 650 | 1 | 1 | $0MAPA20080590338$aDetectores de gases |
| 650 | 1 | 1 | $0MAPA20080568825$aEspectrometría |
| 650 | 1 | 1 | $0MAPA20080537562$aFTIR |
| 700 | 1 | $0MAPA20080198398$aLevine, Steven P. | |
| 700 | 1 | $0MAPA20080220570$aHerget, William F. | |
| 740 | 0 | $aAmerican Industrial Hygiene Association journal | |
| 773 | 0 | $tAmerican Industrial Hygiene Association journal$dAkron, Ohio$gVol. 50, nº 2, February 1989 ; p. 70-77 |