Centro de Documentacion de Fundación MAPFRE - A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

MAP20071019525

A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions / Christopher R. Strang, Steven P. Levine and William F. Herget

Sumario: Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility

En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 50, nº 2, February 1989 ; p. 70-77

1. Higiene industrial . 2. Contaminantes químicos . 3. Gases tóxicos . 4. Vapores . 5. Detectores de gases . 6. Espectrometría . 7. FTIR . I. Levine, Steven P. . II. Herget, William F. . III. Título. IV. Título: American Industrial Hygiene Association journal.