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Development and validation of a protocol for field validation of passive dosimeters for ethylene oxide excursion limit monitoring

<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.loc.gov/MARC21/slim http://www.loc.gov/standards/marcxml/schema/MARC21slim.xsd">
  <record>
    <leader>00000nab a2200000 i 4500</leader>
    <controlfield tag="001">MAP20071020218</controlfield>
    <controlfield tag="003">MAP</controlfield>
    <controlfield tag="005">20080418120132.0</controlfield>
    <controlfield tag="007">hzruuu---uuuu</controlfield>
    <controlfield tag="008">940701e19910401usa||||    | |00010|eng d</controlfield>
    <datafield tag="035" ind1=" " ind2=" ">
      <subfield code="a">6800013520</subfield>
    </datafield>
    <datafield tag="040" ind1=" " ind2=" ">
      <subfield code="a">MAP</subfield>
      <subfield code="b">spa</subfield>
    </datafield>
    <datafield tag="084" ind1=" " ind2=" ">
      <subfield code="a">872</subfield>
    </datafield>
    <datafield tag="100" ind1="1" ind2=" ">
      <subfield code="0">MAPA20080145033</subfield>
      <subfield code="a">Puskar, Mark A.</subfield>
    </datafield>
    <datafield tag="245" ind1="1" ind2="0">
      <subfield code="a">Development and validation of a protocol for field validation of passive dosimeters for ethylene oxide excursion limit monitoring</subfield>
      <subfield code="c">Mark A. Puskar, Frank G. Szopinski, Lawrence H. Hecker</subfield>
    </datafield>
    <datafield tag="520" ind1=" " ind2=" ">
      <subfield code="a">An exposure and analysis protocol is described for the field validation of passive dosimeters for ethylene oxide excursion limit monitoring. The protocol calls for the use of a field exposure chamber with concurrent sampling using Tedlar air-sampling bags. The bags are analyzed inmediately after sampling by gas chromatography with flame ionization detection</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080585679</subfield>
      <subfield code="a">Higiene industrial</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080605278</subfield>
      <subfield code="a">Contaminantes químicos</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080576974</subfield>
      <subfield code="a">Oxido de etileno</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080613655</subfield>
      <subfield code="a">Control de contaminantes</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080554033</subfield>
      <subfield code="a">Dosimetría</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080554040</subfield>
      <subfield code="a">Dosímetros</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080552282</subfield>
      <subfield code="a">Protocolo</subfield>
    </datafield>
    <datafield tag="650" ind1="1" ind2="1">
      <subfield code="0">MAPA20080556891</subfield>
      <subfield code="a">Validación</subfield>
    </datafield>
    <datafield tag="700" ind1="1" ind2=" ">
      <subfield code="0">MAPA20080255763</subfield>
      <subfield code="a">Szopinski, Frank G.</subfield>
    </datafield>
    <datafield tag="700" ind1="1" ind2=" ">
      <subfield code="0">MAPA20080244958</subfield>
      <subfield code="a">Hecker, Lawrence H.</subfield>
    </datafield>
    <datafield tag="740" ind1="0" ind2=" ">
      <subfield code="a">American Industrial Hygiene Association journal</subfield>
    </datafield>
    <datafield tag="773" ind1="0" ind2=" ">
      <subfield code="t">American Industrial Hygiene Association journal</subfield>
      <subfield code="d">Akron, Ohio</subfield>
      <subfield code="g">Vol. 52, nº 4, April 1991 ; p. 145-150</subfield>
    </datafield>
  </record>
</collection>