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Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide

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1001 ‎$0‎MAPA20080255763‎$a‎Szopinski, Frank G.
24510‎$a‎Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide‎$c‎Frank G. Szopinski, Mark A. Puskar, Lawrence H. Hecker
520  ‎$a‎In this study, the method accuracy of three types of ethylene oxide passive dosimeters (3M 3550/3551, Crystal Diagnostics AirScan, and Assay Technology EO CHEM CHIP) were estimated in a hospital products sterilization facility at concentrations bracketing the 5 ppm excursion limit. A specially designed field exposure chamber was developed to allow all monitors to be exposed for the exact same time in the field. The validation of this exposure chamber and sampling protocol is detailed
65011‎$0‎MAPA20080585679‎$a‎Higiene industrial
65011‎$0‎MAPA20080605278‎$a‎Contaminantes químicos
65011‎$0‎MAPA20080576974‎$a‎Oxido de etileno
65011‎$0‎MAPA20080613655‎$a‎Control de contaminantes
65011‎$0‎MAPA20080554033‎$a‎Dosimetría
65011‎$0‎MAPA20080554040‎$a‎Dosímetros
65011‎$0‎MAPA20080552282‎$a‎Protocolo
65011‎$0‎MAPA20080556891‎$a‎Validación
7001 ‎$0‎MAPA20080145033‎$a‎Puskar, Mark A.
7001 ‎$0‎MAPA20080244958‎$a‎Hecker, Lawrence H.
7400 ‎$a‎American Industrial Hygiene Association journal
7730 ‎$t‎American Industrial Hygiene Association journal‎$d‎Akron, Ohio‎$g‎Vol. 52, nº 4, April 1991 ; p. 151-157