Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide
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<rdf:Description>
<dc:creator>Szopinski, Frank G.</dc:creator>
<dc:creator>Puskar, Mark A.</dc:creator>
<dc:creator>Hecker, Lawrence H.</dc:creator>
<dc:date>1991-04-01</dc:date>
<dc:description xml:lang="es">Sumario: In this study, the method accuracy of three types of ethylene oxide passive dosimeters (3M 3550/3551, Crystal Diagnostics AirScan, and Assay Technology EO CHEM CHIP) were estimated in a hospital products sterilization facility at concentrations bracketing the 5 ppm excursion limit. A specially designed field exposure chamber was developed to allow all monitors to be exposed for the exact same time in the field. The validation of this exposure chamber and sampling protocol is detailed</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/48059.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Oxido de etileno</dc:subject>
<dc:subject xml:lang="es">Control de contaminantes</dc:subject>
<dc:subject xml:lang="es">Dosimetría</dc:subject>
<dc:subject xml:lang="es">Dosímetros</dc:subject>
<dc:subject xml:lang="es">Protocolo</dc:subject>
<dc:subject xml:lang="es">Validación</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide</dc:title>
<dc:title xml:lang="es">Título: American Industrial Hygiene Association journal</dc:title>
<dc:relation xml:lang="es">En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 52, nº 4, April 1991 ; p. 151-157</dc:relation>
</rdf:Description>
</rdf:RDF>