Contamination in an experimental gallium arsenide etch system
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<title>Contamination in an experimental gallium arsenide etch system</title>
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<title>American Industrial Hygiene Association journal</title>
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<namePart>Ruuskanen, J.</namePart>
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<abstract displayLabel="Summary">A study in a university setting was undertaken on the by-products which accumulated within a plasma etching reactor system from two years of sporadic dry etching of gallium arsenide wafers. The deposits on the reactor chamber walls, in the vacuum pump oil and its filter, in the oil mist eliminator, and in the exhaust charcoal canister were analyzed for 33 elements by simultaneous inductively coupled plasma atomic emission spectroscopy</abstract>
<note type="statement of responsibility">J. Ruuskanen... [et al.]</note>
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<topic>Contaminantes químicos</topic>
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<topic>Arseniuro de galio</topic>
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<title>American Industrial Hygiene Association journal</title>
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<publisher>Akron, Ohio</publisher>
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<text>Vol. 51, nº 1, January 1990 ; p. 8-13</text>
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