Arsenic levels in hair of workers in a semiconductor fabrication facility
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| 040 | $aMAP$bspa | ||
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| 100 | 1 | $0MAPA20080144005$aPeyster, Ann de | |
| 245 | 1 | 0 | $aArsenic levels in hair of workers in a semiconductor fabrication facility$cAnn de Peyster, Jeffrey A. Silvers |
| 520 | $aThe study examined the relationship between total arsenic levels in hair of employees in a semiconductor farbrication facility and job responsibility, a surrogate variable for arsenic exposure potential. Maintenance personnel who regularly worked in equipment cleaning areas were assumed to have higher potential for occupational exposure than other employees. Occipital scalp hair samples were collected from 30 maintenance personnel, supervisors, and equipment engineers with highm, medium, and low potential for exposure and from 26 administrative employees. Total arsenic in hair was measured by atomic absorption spectroscopy with hydride generation | ||
| 650 | 1 | 1 | $0MAPA20080585679$aHigiene industrial |
| 650 | 1 | 1 | $0MAPA20080595166$aCircuitos eléctricos |
| 650 | 1 | 1 | $0MAPA20080573942$aSemiconductores |
| 650 | 1 | 1 | $0MAPA20080568832$aEspectroscopia |
| 650 | 1 | 1 | $0MAPA20080589127$aArsénico inorgánico |
| 650 | 1 | 1 | $0MAPA20080543266$aCabello |
| 650 | 1 | 1 | $0MAPA20080560973$aValores TLV |
| 650 | 1 | 1 | $0MAPA20080560850$aToxicología |
| 700 | 1 | $0MAPA20080255114$aSilvers, Jeffrey A. | |
| 740 | 0 | $aAmerican Industrial Hygiene Association journal | |
| 773 | 0 | $tAmerican Industrial Hygiene Association journal$dAkron, Ohio$gVol. 56, nº 4, April 1995 ; p. 377-383 |