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A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

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<rdf:Description>
<dc:creator>Strang, Christopher R.</dc:creator>
<dc:creator>Levine, Steven P.</dc:creator>
<dc:creator>Herget, William F.</dc:creator>
<dc:date>1989-02-01</dc:date>
<dc:description xml:lang="es">Sumario: Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility</dc:description>
<dc:identifier>https://documentacion.fundacionmapfre.org/documentacion/publico/es/bib/47423.do</dc:identifier>
<dc:language>eng</dc:language>
<dc:rights xml:lang="es">InC - http://rightsstatements.org/vocab/InC/1.0/</dc:rights>
<dc:subject xml:lang="es">Higiene industrial</dc:subject>
<dc:subject xml:lang="es">Contaminantes químicos</dc:subject>
<dc:subject xml:lang="es">Gases tóxicos</dc:subject>
<dc:subject xml:lang="es">Vapores</dc:subject>
<dc:subject xml:lang="es">Detectores de gases</dc:subject>
<dc:subject xml:lang="es">Espectrometría</dc:subject>
<dc:subject xml:lang="es">FTIR</dc:subject>
<dc:type xml:lang="es">Artículos y capítulos</dc:type>
<dc:title xml:lang="es">A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions</dc:title>
<dc:title xml:lang="es">Título: American Industrial Hygiene Association journal</dc:title>
<dc:relation xml:lang="es">En: American Industrial Hygiene Association journal. - Akron, Ohio. - Vol. 50, nº 2, February 1989 ; p. 70-77</dc:relation>
</rdf:Description>
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