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Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide

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<title>Field validation of three passive dosimeters for excursion limit monitoring of ethylene oxide</title>
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<title>American Industrial Hygiene Association journal</title>
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<name type="personal" usage="primary" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080255763">
<namePart>Szopinski, Frank G.</namePart>
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<name type="personal" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080145033">
<namePart>Puskar, Mark A.</namePart>
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<name type="personal" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080244958">
<namePart>Hecker, Lawrence H.</namePart>
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<dateIssued encoding="marc">1991</dateIssued>
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<abstract displayLabel="Summary">In this study, the method accuracy of three types of ethylene oxide passive dosimeters (3M 3550/3551, Crystal Diagnostics AirScan, and Assay Technology EO CHEM CHIP) were estimated in a hospital products sterilization facility at concentrations bracketing the 5 ppm excursion limit. A specially designed field exposure chamber was developed to allow all monitors to be exposed for the exact same time in the field. The validation of this exposure chamber and sampling protocol is detailed</abstract>
<note type="statement of responsibility">Frank G. Szopinski, Mark A. Puskar, Lawrence H. Hecker</note>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080585679">
<topic>Higiene industrial</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080605278">
<topic>Contaminantes químicos</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080576974">
<topic>Oxido de etileno</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080613655">
<topic>Control de contaminantes</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080554033">
<topic>Dosimetría</topic>
</subject>
<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080554040">
<topic>Dosímetros</topic>
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<topic>Protocolo</topic>
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<subject authority="lcshac" xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="MAPA20080556891">
<topic>Validación</topic>
</subject>
<classification authority="">872</classification>
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<title>American Industrial Hygiene Association journal</title>
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<publisher>Akron, Ohio</publisher>
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<part>
<text>Vol. 52, nº 4, April 1991 ; p. 151-157</text>
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