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A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions

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1001 ‎$0‎MAPA20080311483‎$a‎Strang, Christopher R.
24512‎$a‎A Preliminary evaluation of the Fourier Transform Infrared (FTIR) spectrometer as a quantitative air monitor for semiconductor manufacturing process emissions‎$c‎Christopher R. Strang, Steven P. Levine and William F. Herget
520  ‎$a‎Preliminary research showed that the Fourier transform infrared (FTIR) spectrometer may be appropriate for detecting the various gases and vapors that could be present at a semiconductor manufacturing facility. A subset of the many gases and vapors used during the silicon processing sequence were diluted in air to sub-part-per-million concentrations to simulate potential workplace conditions. The preliminary results support the conclusion that the FTIR spectrometer is appropriate for quantitative air monitoring of selected compounds at a semiconductor manufacturing facility
65011‎$0‎MAPA20080585679‎$a‎Higiene industrial
65011‎$0‎MAPA20080605278‎$a‎Contaminantes químicos
65011‎$0‎MAPA20080565817‎$a‎Gases tóxicos
65011‎$0‎MAPA20080545673‎$a‎Vapores
65011‎$0‎MAPA20080590338‎$a‎Detectores de gases
65011‎$0‎MAPA20080568825‎$a‎Espectrometría
65011‎$0‎MAPA20080537562‎$a‎FTIR
7001 ‎$0‎MAPA20080198398‎$a‎Levine, Steven P.
7001 ‎$0‎MAPA20080220570‎$a‎Herget, William F.
7400 ‎$a‎American Industrial Hygiene Association journal
7730 ‎$t‎American Industrial Hygiene Association journal‎$d‎Akron, Ohio‎$g‎Vol. 50, nº 2, February 1989 ; p. 70-77